Epitaxial-Silicon Wafer Integrated Process Line Award Number: DE-EE0007203 CX(s) Applied: A9, B3.6 Solar Energy Technologies Office Date: 04/29/2016 Location(s): CA Office(s): Golden Field Office
Office of NEPA Policy and Compliance
April 29, 2016
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Epitaxial-Silicon Wafer Integrated Process Line
Award Number: DE-EE0007203
CX(s) Applied: A9, B3.6
Solar Energy Technologies Office
Date: 04/29/2016
Location(s): CA
Office(s): Golden Field Office
The U.S. Department of Energy (DOE) is proposing to provide federal funding to Applied Materials, Inc. to develop lab-scale wet and dry processes and equipment for porous silicon film formation and silicon deposition, wafer exfoliation, wafer post-processing and substrate reclaim for solar photovoltaic (PV) cell and module applications.
The proposed project activities would include installation and operation of a chemical vapor deposition tool, electrochemical wafer etching and cleaning, and analysis of wafer characteristics which would occur at the Applied Materials process and equipment laboratory in Santa Clara, CA. Substrate cleaning, preparation and porous silicon formation-related work using a wet bench would be conducted at the Engineered Solutions facility in Sunnyvale, CA.