CX-101312 Low-cost, high-efficiency III-V photovoltaics enabled by remote epitaxy through graphene

Award Number: DE-EE0008558CX(s) Applied: A9, B3.6Solar Energy Technologies OfficeLocation(s): MAOffice(s): Golden Field Office

Office of NEPA Policy and Compliance

December 26, 2018
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Award Number: DE-EE0008558
CX(s) Applied: A9, B3.6
Solar Energy Technologies Office
Location(s): MA
Office(s): Golden Field Office

The U.S. Department of Energy (DOE) is proposing to provide funding to Massachusetts Institute of Technology (MIT) to develop Gallium arsenide (GaAs) photovoltaic (PV) cells by combining two existing manufacturing processes, remote epitaxy and 2-dimensional layer transfer (2DLT), which allow for reuse of PV substrates, with another process known as Dynamic-hydride vapor phase epitaxy (D-HVPE), which would help lower the costs of production associated with the first two methods. The project would be completed over two Budget Periods (BPs), with a Go/No-Go Decision Point in between each BP.