Epitaxial-Silicon Wafer Integrated Process Line Award Number: DE-EE0007203 CX(s) Applied: A9, B3.6 Solar Energy Technologies Office Date: 04/29/2016 Location(s): CA Office(s): Golden Field Office
B31 Fracture Mechanics Testing Lab CX(s) Applied: B3.6Date: 04/28/2016 Location(s): OregonOffices(s): National Energy Technology Laboratory
NEPA 4752, Depleted Uranium Technology Testing for the Uranium Processing Facility CX(s) Applied: B3.6Date: 04/28/2016 Location(s): TennesseeOffices(s): Y-12 Site Office
Demonstration of Near-Field Thermophotovoltaic (TPV) Energy Generation CX(s) Applied: B3.6Date: 04/27/2016 Location(s): Multiple LocationsOffices(s): Advanced Research Projects Agency-Energy
Categorical Exclusion Determination
Categorical Exclusion Determination
Categorical Exclusion Determination
Synthesis of Adduct for Ion Exchange Materials CX(s) Applied: B3.6Date: 04/27/2016 Location(s): South CarolinaOffices(s): Savannah River Operations Office
Categorical Exclusion Determination
Simulant Preparation CX(s) Applied: B3.6Date: 04/27/2016 Location(s): South CarolinaOffices(s): Savannah River Operations Office