Massively Parallel Two-Photon Lithography using Metaoptics
Date: Tuesday, February 24, 2026
Time: 2:00 PM ET / 11:00 AM PT
Click here to register!
Join us for a National Lab Discovery Series webinar spotlighting a recent breakthrough from Lawrence Livermore National Laboratory (LLNL) that is opening new frontiers in precision 3D microfabrication.
LLNL’s metalens-based two-photon lithography (TPL) technology represents a next-generation leap in high-precision, high-throughput additive manufacturing. This technology enables the parallel fabrication of complex, multi-scale 3D structures with 120,000 focal spots in parallel—a paradigm shift for advancing microelectronics, quantum devices, energy systems, and beyond.
In this session, LLNL researchers will explore how this additive manufacturing platform is accelerating innovation in critical domains where size, complexity, and materials performance all matter.
What You’ll Learn:
- How LLNL’s metalens TPL system breaks speed and scale barriers in 3D nanofabrication
- How metalens arrays with spatially adaptive illumination enable massive parallelization while preserving geometric generality
- How TPL is being applied to LLNL’s key mission areas such as inertial fusion energy and quantum computing
- How companies can evaluate and license this platform for high-value commercial uses
- Live Q&A with the LLNL research team
Who Should Join:
- R&D directors and technical leads in quantum computing, microelectronics, fusion energy systems, and advanced materials
- Advanced manufacturing teams exploring micro-scale precision solutions
- Designers and engineers in photonics, MEMS, semiconductor, and bio-medical devices
- Technology scouts and IP professionals interested in licensing or co-development
- Corporate innovators evaluating next-gen additive manufacturing platforms
About the Technology:
Two-photon lithography (TPL) is a high-resolution 3D printing method that scans a tightly focusd ultrafast laser to solidify photopolymers at micro- and nano-scale. LLNL’s metalens TPL system uses a metalens array to generate more than 120,000 focal spots that can be individually addressed to perform TPL in concert, enabling ~1000X faster 3D printing across a write field of 12cm².
This technology is a winner of the 2025 R&D 100 Award, and it is recently published in Nature (Gu et al., Nature 648, 591–599 (2025)). It demonstrates the potential of 3D nanolithography towards wafer-scale production, showing how TPL could be used at scale for applications in microelectronics , biomedicine, quantum technology and fusion target production. LLNL is actively seeking partners to license and co-develop this technology.